We illustrate how the use of femtosecond lasers and short wavelength nanosecond lasers in conjunction with chemical environments are remarkably effective tools for modifying wide bandgap materials. We show that in both cases, multiphoton absorption with and without reactive environments can drive non-linear processes leading to bulk defect formation as well as material removal well below intensity thresholds for plasma formation. The role of surface defects (e.g., atomic steps) is shown to remain a dominant factor in the observed surface modification of transparent, dielectric materials.
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